Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers

Xavier Chevalier (1) , Cindy Gomes Correia (2, 3) , Gwenaelle Pound-Lana (4, 5) , Philippe Bézard (4, 5) , Matthieu Sérégé (4, 5) , Camille Petit-Etienne (4, 5) , Guillaume Gay (4, 5) , Gilles Cunge (4, 5) , Benjamin Cabannes-Boué (2, 3) , Célia Nicolet (1) , Christophe Navarro (1) , Ian Cayrefourcq (1) , Marcus Müller (6) , Georges Hadziioannou (2, 3) , Ilias Iliopoulos (7) , Guillaume Fleury (2, 3) , Marc Zelsmann (4, 5)

1 Arkema - Arkema
2 LCPO - Laboratoire de Chimie des Polymères Organiques
3 Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
4 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
5 LTM - Laboratoire des technologies de la microélectronique
6 Georg-August-University = Georg-August-Universität Göttingen
7 PIMM - Laboratoire Procédés et Ingénierie en Mécanique et Matériaux

The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful method for the manufacture of high-resolution features. Critical issues remain to be addressed for successful implementation of DSA, such as dewetting and controlled orientation of BCP domains through physicochemical manipulations at the BCP interfaces, and the spatial positioning and registration of the BCP features. Here, we introduce novel top-coat (TC) materials designed to undergo cross-linking reactions triggered by thermal or photoactivation processes. The cross-linked TC layer with adjusted composition induces a mechanical confinement of the BCP layer, suppressing its dewetting while promoting perpendicular orientation of BCP domains. The selection of areas of interest with perpendicular features is performed directly on the patternable TC layer via a lithography step and leverages attractive integration pathways for the generation of locally controlled BCP patterns and nanostructured BCP multilayers.

Mots clés: General Materials Science; Lithography; Block copolymers; Self-assembly; Cross-linkable top coats; Top-coat patterning; Nanopatterning; Dewetting

Domaines: Sciences de l'ingénieur [physics]; Polymères; Matériaux; Matière Molle [cond-mat.soft]

Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, Philippe Bézard, Matthieu Sérégé, et al.. Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers. ACS Applied Materials & Interfaces, 2021, 13 (9), pp.11224-11236. ⟨10.1021/acsami.1c00694⟩. ⟨hal-03218670⟩