Static and low frequency noise characterization of ultra-thin body InAs MOSFETs - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Solid-State Electronics Année : 2018

Static and low frequency noise characterization of ultra-thin body InAs MOSFETs

Résumé

A complete static and low frequency noise characterization of ultra-thin body InAs MOSFETs is presented. Characterization techniques, such as the well-known Y-function method established for Si MOSFETs, are applied in order to extract the electrical parameters and study the behavior of these research grade devices. Additionally, the Lambert-W function parameter extraction methodology valid from weak to strong inversion is also used in order to verify its applicability in these experimental level devices. Moreover, a low-frequency noise characterization of the UTB InAs MOSFETs is presented, revealing carrier trapping/detrapping in slow oxide traps and remote Coulomb scattering as origin of 1/f noise, which allowed for the extraction of the oxide trap areal density. Finally, Lorentzian-like noise is also observed in the sub-micron area devices and attributed to both Random Telegraph Noise from oxide individual traps and g-r noise from the semiconductor interface.
Fichier non déposé

Dates et versions

hal-01948029 , version 1 (07-12-2018)

Identifiants

Citer

T.A. Karatsori, M. Pastorek, C.G. Theodorou, A. Fadjie, Nicolas Wichmann, et al.. Static and low frequency noise characterization of ultra-thin body InAs MOSFETs. Solid-State Electronics, 2018, 143, pp.56-61. ⟨10.1016/j.sse.2017.12.001⟩. ⟨hal-01948029⟩
51 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More