INCREASE OF THE NICKEL TARGET TEMPERATURE IN MAGNETRON SPUTTERING
Résumé
A Ni target has been disconnected from a water-cooled magnetron in order to induce a rise of its temperature. The time evolutions of the cathode voltage, of the target temperature, of the magnetic field and of the infrared radiation emitted by the target were investigated. An increase in the deposition rate and a change in the thin film microstructure has been observed.