Studies of LPCVD Al–Fe–O deposits by XPS, EELS and Mössbauer spectroscopies - Archive ouverte HAL Access content directly
Journal Articles Surface and Coatings Technology Year : 1998

Studies of LPCVD Al–Fe–O deposits by XPS, EELS and Mössbauer spectroscopies

Abstract

Al–Fe–O layers were deposited on silicon carbide or aluminium nitride substrates by low-pressure chemical vapour deposition (LPCVD). Aluminium trichloride, hydrogen and nitrous oxide gases have been used to generate crystallized alumina. Simultaneously, iron pentacarbonyl combined with carbon dioxide has been added to introduce iron in the alumina layers. The relation between the morphology and iron content has been studied by SEM, XPS, TEM, EELS and Mössbauer techniques. Iron concentration is studied throughout the thickness of the films. It is homogeneous around 1 at% Fe for the lowest Fe(CO)5/AlCl3 ratio and it is heterogeneous for higher Fe(CO)5/AlCl3 ratios.

Dates and versions

hal-01745059 , version 1 (27-03-2018)

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C Labatut, R Berjoan, B Armas, Sylvie Schamm-Chardon, Jean Sévely, et al.. Studies of LPCVD Al–Fe–O deposits by XPS, EELS and Mössbauer spectroscopies. Surface and Coatings Technology, 1998, 105 (1-2), pp.31-37. ⟨10.1016/S0257-8972(97)00562-8⟩. ⟨hal-01745059⟩
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