Studies of LPCVD Al–Fe–O deposits by XPS, EELS and Mössbauer spectroscopies

C Labatut (1) , R Berjoan (1) , B Armas (1) , Sylvie Schamm-Chardon (2) , Jean Sévely (2) , A Roig (3) , E Molins (3)

1 IMP-CNRS - Institut De Science Et De Génie Des Matériaux Et Procédés
2 CEMES-MEM - Matériaux et dispositifs pour l'Electronique et le Magnétisme
3 ICMAB - Institut de Ciència de Materials de Barcelona

Al–Fe–O layers were deposited on silicon carbide or aluminium nitride substrates by low-pressure chemical vapour deposition (LPCVD). Aluminium trichloride, hydrogen and nitrous oxide gases have been used to generate crystallized alumina. Simultaneously, iron pentacarbonyl combined with carbon dioxide has been added to introduce iron in the alumina layers. The relation between the morphology and iron content has been studied by SEM, XPS, TEM, EELS and Mössbauer techniques. Iron concentration is studied throughout the thickness of the films. It is homogeneous around 1 at% Fe for the lowest Fe(CO)5/AlCl3 ratio and it is heterogeneous for higher Fe(CO)5/AlCl3 ratios.

Domaines: Physique [physics]

C Labatut, R Berjoan, B Armas, Sylvie Schamm-Chardon, Jean Sévely, et al.. Studies of LPCVD Al–Fe–O deposits by XPS, EELS and Mössbauer spectroscopies. Surface and Coatings Technology, 1998, 105 (1-2), pp.31-37. ⟨10.1016/S0257-8972(97)00562-8⟩. ⟨hal-01745059⟩