Effect of O2, Ar/H2 and CF4 plasma treatments on the structural and dielectric propoerties of parylene-C thin films

Abdelkader Kahouli (1) , Alain Sylvestre (1) , Sébastien Pairis (2) , Jean-Luc Garden (3) , Emmanuel André , Fathi Jomni , Béchir Yangui

1 G2ELab - Laboratoire de Génie Electrique de Grenoble
2 NEEL - C2MA - Croissance Cristalline et MicroAnalyse
3 NEEL - Institut Néel

Domaines: Energie électrique

Abdelkader Kahouli, Alain Sylvestre, Sébastien Pairis, Jean-Luc Garden, Emmanuel André, et al.. Effect of O2, Ar/H2 and CF4 plasma treatments on the structural and dielectric propoerties of parylene-C thin films. Journal of Physics D: Applied Physics, 2012, 45 (21), pp.215306. ⟨10.1088/0022-3727/45/21/215306⟩. ⟨hal-00815148⟩