Self-Assembled Monolayers deposition in Supercritical Carbon Dioxide
Résumé
Self-Assembled Monolayers of organic molecules have been successfully deposited onto wafer surface in supercritical carbon dioxide. Deposition method and apparatus are described. The layers are characterized by AFM and water droplet contact angle. Interest of this technique compared to liquid and vapor phase is discussed and studied for surface conversion from hydrophilic to hydrophobic for different materials.
Origine : Accord explicite pour ce dépôt
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