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Metallic source/drain for advanced MOS architectures : from material engineering to device integration
Emmanuel Dubois
1
G. Larrieu
N. Breil
R. Valentin
Francois Danneville
Dmitri Yarekha
N. Reckinger
Xing Tang
A. Halimaoui
R. Rengel
E. Pascual
A. Pouydebasque
X. Wallart
S. Godey
J. Ratajczak
A. Laszcz
J. Katcki
J.P. Raskin
Gilles Dambrine
A. Cros
T. Skotnicki
Emmanuel Dubois 1
Author Employer institution : Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 IdHAL : emmanuel-dubois-iemn ORCID : https://orcid.org/0000-0002-0347-010X
G. Larrieu
Author
N. Breil
Author
R. Valentin
Author
Francois Danneville
Author IdHAL : francois-danneville
Dmitri Yarekha
Author IdHAL : dmitri-yarekha
N. Reckinger
Author
Xing Tang
Author Employer institution : Comprehensive Cancer Center [Colombus]
X. Wallart
Author IdHAL : xavier-wallart ORCID : https://orcid.org/0000-0002-0915-0043
S. Godey
Author IdHAL : sylvie-godey ORCID : https://orcid.org/0000-0003-2406-3519
J. Ratajczak
Author
A. Laszcz
Author
T. Skotnicki
Author
1
IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 ([Univ. Lille, CNRS, Ecole Centrale Lille, Yncréa-ISEN, UVHC] ––
Laboratoire Central – Cité Scientifique – Avenue Poincaré – CS 60069 – 59652 VILLENEUVE D’ASCQ CEDEX - France)
- Centrale Lille (École Centrale de Lille - Cité Scientifique - CS 20048 59651 Villeneuve d'Ascq Cedex - France)
- Institut supérieur de l'électronique et du numérique (ISEN) (France)
- UVHC - Université de Valenciennes et du Hainaut-Cambrésis (Campus Mont Houy 59313 Valenciennes Cedex 9 - France)
- Université de Lille (Lille - France)
- CNRS - Centre National de la Recherche Scientifique : UMR8520 (France)
- UPHF - Université Polytechnique Hauts-de-France (Campus Mont Houy 59313 Valenciennes Cedex 9 - France)
Document type :
Conference papers
Complete list of metadata
https://hal.archives-ouvertes.fr/hal-00575267
Contributor : Collection Iemn Connect in order to contact the contributor
Submitted on : Thursday, March 10, 2011 - 9:08:56 AM
Last modification on : Wednesday, March 23, 2022 - 3:50:24 PM
Contributor : Collection Iemn Connect in order to contact the contributor
Submitted on : Thursday, March 10, 2011 - 9:08:56 AM
Last modification on : Wednesday, March 23, 2022 - 3:50:24 PM
Identifiers
- HAL Id : hal-00575267, version 1
Collections
IEMN | CNRS | UNIV-LILLE | UNIV-VALENCIENNES
Citation
Emmanuel Dubois, G. Larrieu, N. Breil, R. Valentin, Francois Danneville, et al.. Metallic source/drain for advanced MOS architectures : from material engineering to device integration. SINANO-NANOSIL Workshop, Silicon-based CMOS and Beyond-CMOS Nanodevices, 2009, Athens, Greece. ⟨hal-00575267⟩
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