Open air, atmospheric pressure microwave plasma torch assisted chemical vapour deposition system for thin oxide film deposition - Archive ouverte HAL Access content directly
Conference Papers Year : 2008

Open air, atmospheric pressure microwave plasma torch assisted chemical vapour deposition system for thin oxide film deposition

S.S. Asad
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Science des Procédés Céramiques et de Traitements de Surface
Christelle Dublanche-Tixier
Axe 2 : procédés de traitements de surface
O. Leroy
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Cédric Jaoul
Axe 2 : procédés de traitements de surface
CV
Pascal Tristant
Axe 2 : procédés de traitements de surface
C. Boisse-Laporte
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P. Leprince
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https://hal.science/hal-00362359

Submitted on : Wednesday, February 18, 2009-9:23:33 AM

Last modification on : Thursday, April 11, 2024-1:08:12 PM

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hal-00362359 , version 1 (18-02-2009)

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  • HAL Id : hal-00362359 , version 1

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S.S. Asad, Christelle Dublanche-Tixier, O. Leroy, Cédric Jaoul, Pascal Tristant, et al.. Open air, atmospheric pressure microwave plasma torch assisted chemical vapour deposition system for thin oxide film deposition. 21st International Conference on Surface Modification Technologies, Sep 2007, PARIS, France. pp.183-190. ⟨hal-00362359⟩

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