Dust cloud dynamics during particle successive generations
Résumé
Silane-based plasmas are widely used to deposit nanostructured silicon thin films or to synthesize silicon nanoparticles. Dust particle formation in Ar/SiH4 plasmas is a continuous phenomenon: as long as silane precursors are provided, new dust generations are formed. Successive generations can be monitored thanks to various electrical (Vdc/3H) and optical (OES, video imaging) diagnostics. Experiments presented in this paper have been performed in a capacitively-coupled radiofrequency discharge, at low pressure (12 Pa) in an Argon/Silane mixture (92:8).
Origine : Accord explicite pour ce dépôt
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