Self-asembly and crystallization behavior of mesoporous, crystalline HfO2 thin films : a model system for the generation of mesostructured transition-metal oxides
Torsten Brezesinski
(1)
,
Bernd Smarsly
(1)
,
Ken-Ichi Iimura
(2)
,
David Grosso
(3)
,
Cédric Boissière
(3)
,
Heinz Amenitsch
(4)
,
Markus Antonietti
(1)
,
Clément Sanchez
(3)
1
Max Planck Institute of Colloids and Interfaces
2 Utsunomiya University, Dpt. of Applied Chemistry, Faculty of Engineering
3 LCMCP (site Paris VI) - Laboratoire de Chimie de la Matière Condensée de Paris (site Paris VI)
4 Institute of Biophysics and X-ray structure research Austrian Academy of Sciences
2 Utsunomiya University, Dpt. of Applied Chemistry, Faculty of Engineering
3 LCMCP (site Paris VI) - Laboratoire de Chimie de la Matière Condensée de Paris (site Paris VI)
4 Institute of Biophysics and X-ray structure research Austrian Academy of Sciences
David Grosso
- Fonction : Auteur
- PersonId : 756360
- ORCID : 0000-0002-9156-6848
- IdRef : 164026673
Cédric Boissière
- Fonction : Auteur
- PersonId : 173526
- IdHAL : cedric-boissiere
- ORCID : 0000-0003-1212-6850
- IdRef : 067332773
Clément Sanchez
- Fonction : Auteur
- PersonId : 181965
- IdHAL : clement-sanchez
- ORCID : 0000-0002-6426-4844
- IdRef : 057595798