High-Quality Planar high-T$_c$ Josephson Junctions
Résumé
Reproducible high-T$_c$ Josephson junctions have been made in a rather simple two-step process using ion irradiation. A microbridge (1 to 5 $\mu$m wide) is firstly designed by ion irradiating a c-axis-oriented YBa$_2$Cu$_3$O$_7_-\delta$ film through a gold mask such as the non-protected part becomes insulating. A lower T$_c$ part is then defined within the bridge by irradiating with a much lower fluence through a narrow slit (20 nm) opened in a standard electronic photoresist. These planar junctions, whose settings can be finely tuned, exhibit reproducible and nearly ideal Josephson characteristics. This process can be used to produce complex Josephson circuits.