Structural Modeling of O/F Correlated Disorder in TaOF 3 and NbOF 3– x (OH) x by Coupling Solid-State NMR and DFT Calculations - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Inorganic Chemistry Année : 2023

Structural Modeling of O/F Correlated Disorder in TaOF 3 and NbOF 3– x (OH) x by Coupling Solid-State NMR and DFT Calculations

Résumé

The structure of MOF3 (M = Nb, Ta) compounds was precisely modeled by combining powder X-ray diffraction, solid-state NMR spectroscopy, and semiempirical dispersion-corrected DFT calculations. It consists of stacked ∞(MOF3) layers along the c⃗ direction formed by heteroleptic cornerconnected MX6 (X = O, F) octahedra. 19F NMR resonance assignments and occupancy rates of the anionic crystallographic sites have been revised. The bridging site is shared equally by the anions, and the terminal site is occupied by F only. An O/F correlated disorder is expected since cis-MO2F4 octahedra are favored, resulting in one-dimensional −F−M−O−M− strings along the <100> and <010> directions. Ten different 2 × 2 × 1 supercells per compound, fulfilling these characteristics, were built. Using DFT calculations and the GIPAW approach, the supercells were relaxed and the 19F isotropic chemical shift values were determined. The agreement between the experimental and calculated 19F spectra is excellent for TaOF3. The 1H and 19F experimental NMR spectra revealed that some of the bridging F atoms are substituted by OH groups, especially in NbOF3. New supercells involving OH groups were generated. Remarkably, the best agreement is obtained for the supercells with the composition closest to that estimated from the 19F NMR spectra, i.e., NbOF2.85(OH)0.15.

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Dates et versions

hal-04250645 , version 1 (19-10-2023)

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Ouail Zakary, Monique Body, Thibault Charpentier, Vincent Sarou-Kanian, Christophe Legein. Structural Modeling of O/F Correlated Disorder in TaOF 3 and NbOF 3– x (OH) x by Coupling Solid-State NMR and DFT Calculations. Inorganic Chemistry, 2023, 62 (40), pp.16627-16640. ⟨10.1021/acs.inorgchem.3c02844⟩. ⟨hal-04250645⟩
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