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Article Dans Une Revue Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Année : 2008

Electrical conductivity of ultra-thin silicon nanowires

Nabil Rochdi
  • Fonction : Auteur
Franck Jandard
  • Fonction : Auteur
Hervé Dallaporta
  • Fonction : Auteur
Viatcheslav Safarov
  • Fonction : Auteur
Jacques Gautier
  • Fonction : Auteur

Résumé

The authors present results on fabricating ultra-thin silicon nanowires on insulators and characterizing their electrical conductivity. The silicon nanowires were fabricated by atomic force microscopy lithography on ultra-thin (8 nm) silicon on insulator substrates. At such minute thicknesses, the device exhibits high sensitivity to the charges trapped at the Si/SiO2 interface. This leads to an unusual behavior of the electrical conductivity of the nanowires as a function of drain-source and gate voltages.
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Dates et versions

hal-04236281 , version 1 (10-10-2023)

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Citer

Nabil Rochdi, Didier Tonneau, Franck Jandard, Hervé Dallaporta, Viatcheslav Safarov, et al.. Electrical conductivity of ultra-thin silicon nanowires. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2008, 26 (1), pp.159-163. ⟨10.1116/1.2823056⟩. ⟨hal-04236281⟩
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