Film formation analysis by diffusive wave spectroscopy

Isabelle Giraud (1) , Eric Dantras (1) , Alice Brun , Hélène Dihang , Laurent Brunel , Alain Bernès (1) , Gérard Meunier , Colette Lacabanne (1)

1 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux

The thin layer analysis is very important for several sectors of industry. Indeed, environmental laws and improvement of performances lead the manufacturers to innovate in the field of coatings and paints. Several classical techniques of characterization (TGA, DMA, etc.) used with this intention do not allow to perform the analysis in situ and are often long and tedious to set up. We propose to solve this problem with a newoptical process. Its technology based on multi-speckle diffusivewave spectroscopy (MS-DWS) allows making real-time analysis in a non-destructive way thanks to an optical measurement. The aim of this work is to highlight correlations between this new technology and the classical methods of analysis. Two film forming polymeric materials were studied, a polydimethylsiloxane (PDMS) and a commercial paint based on an aqueous dispersion of acrylic copolymers. The PDMSwas chosen for the simplicity of its film forming process and is used as model. The paint having a more complex drying mechanism enables to complete this study.

Mots clés: MS-DWS; PDMS cross linkage; Latex film formation

Domaines: Matériaux

Isabelle Giraud, Eric Dantras, Alice Brun, Hélène Dihang, Laurent Brunel, et al.. Film formation analysis by diffusive wave spectroscopy. Progress in Organic Coatings, 2008, 64 (4), pp.515-519. ⟨10.1016/j.porgcoat.2008.07.017⟩. ⟨hal-03590827⟩