Electrophoretic impregnation of porous anodic aluminum oxide film by silica nanoparticles

Benoit Fori (1, 2) , Pierre-Louis Taberna (1) , Laurent Arurault (1) , Jean-Pierre Bonino (1) , Céline Gazeau (2) , Pierre Bares (2)

1 CIRIMAT - Centre interuniversitaire de recherche et d'ingenierie des matériaux
2 Mecaprotec Industries

In this paper, it is proposed to study the deposition of nanoparticles by electrophoretic deposition (EPD) inside a porous anodic aluminum oxide film. Despite the presence of a highly resistive barrier layer at the metal-anodic film interface, porous anodic films on AA 1050A were successfully filled by 16-nm, surface modified silica particles. During this study it was shown that both the colloidal suspension conductivity and the applied electric field drive the penetration into the porous film. FEG-SEM observations showed that large (130-nm diameter), linear pores of 10 μm in length can be completely filled in 1 min. These results attest that porous anodic films can be efficiently filled with nanoparticles by EPD despite the presence of the barrier layer.

Mots clés: Electrophoretic deposition; Aluminum; Anodic film; Silica suspension

Domaines: Matériaux

Benoit Fori, Pierre-Louis Taberna, Laurent Arurault, Jean-Pierre Bonino, Céline Gazeau, et al.. Electrophoretic impregnation of porous anodic aluminum oxide film by silica nanoparticles. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2012, 415, pp.187-194. ⟨10.1016/j.colsurfa.2012.09.011⟩. ⟨hal-03528860⟩