Nondestructive Femtosecond Laser Lithography of Ni Nanocavities by Controlled Thermo-Mechanical Spallation at the Nanoscale

Vasily Temnov (1) , Alexandr Alekhin (1) , Andrey Samokhvalov (2) , Dmitry Ivanov (2) , Alexey Lomonosov (3) , Paolo Vavassori (4) , Evgeny Modin (4) , Vadim Veiko (2)

1 IMMM - Institut des Molécules et Matériaux du Mans
2 ITMO - National Research University of Information Technologies, Mechanics and Optics [St. Petersburg]
3 GPI - A. M. Prokhorov General Physics Institute
4 CICNanoGUNE

We present a new approach to femtosecond direct laser writing lithography to pattern nanocavities in ferromagnetic thin films. To demonstrate the concept we irradiated 300 nm thin nickel films by single intense femtosecond laser pulses through the glass substrate and created complex surface landscapes at the nickel-air interface. Using a fluence above the ablation threshold, the process is destructive and irradiation leads 1

Domaines: Science non linéaire [physics]; Physique [physics]; Sciences de l'ingénieur [physics]

Vasily Temnov, Alexandr Alekhin, Andrey Samokhvalov, Dmitry Ivanov, Alexey Lomonosov, et al.. Nondestructive Femtosecond Laser Lithography of Ni Nanocavities by Controlled Thermo-Mechanical Spallation at the Nanoscale. Nano Letters, 2020, ⟨10.1021/acs.nanolett.0c02574⟩. ⟨hal-02988635⟩