Selective grating obtained by dye micro-structuration based on local photo- bleaching using laser writer

Alban Gassenq (1) , Kevin Chevrier (1) , Antoine Bard (1) , Jean-Michel Benoit (1) , Clémentine Symonds (1) , Joël Bellessa (1)

1 iLM - MNP - iLM - Matériaux et nanostructures photoniques

We propose a method to pattern organic optically active materials based on local photo-bleaching for making wavelength selective grating. Usually, photo-bleaching is considered as a limitation for organic emitter. Here, this property is exploited to locally suppress dye emission and absorption at the microscale with abrupt interface and no changes in layer thickness. Periodic patterns were fabricated and exhibit diffraction only at 590nm wavelength with spectral selectivity of 11nm. Based on laser writer flexibility and efficiency, this study shows the potential of local photo-bleaching for several applications like wavelength selective grating fabrication.

Mots clés: Cholesteric liquid crystals; Lithography; Light scattering; Organic materials; Light diffraction; Maskless lithography

Domaines: Physique [physics]; Physique [physics]; Optique [physics.optics]

Alban Gassenq, Kevin Chevrier, Antoine Bard, Jean-Michel Benoit, Clémentine Symonds, et al.. Selective grating obtained by dye micro-structuration based on local photo- bleaching using laser writer. Applied optics, 2020, 59 (19), pp.5697-5701. ⟨10.1364/AO.393103⟩. ⟨hal-02879605⟩