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Poster De Conférence Année : 2011

Voltage Waveform Tailoring in a RF-CCP reactor: Exploration of self-bias, electron density and current waveform

E.V. Johnson
Jean-Paul Booth
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hal-02611277 , version 1 (18-05-2020)

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  • HAL Id : hal-02611277 , version 1

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Pierre-Alexandre Delattre, S. Pouliquen, E.V. Johnson, Jean-Paul Booth. Voltage Waveform Tailoring in a RF-CCP reactor: Exploration of self-bias, electron density and current waveform. ICPIG, Aug 2011, Belfast, Northern Ireland, United Kingdom. 2011. ⟨hal-02611277⟩
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