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Article Dans Une Revue Applied Surface Science Année : 2007

Holographic lithography of a two-dimensional hexagonal structure: Effect of beam polarization

Résumé

A comparison is made between the theoretical determination of the interference contrast function with fabricated two-dimensional hexagonal structures of submicron lattice constant. Experiments were performed using a siloxane based hybrid organic-inorganic material and a holographic lithography method. Thin hybrid structured layers were fabricated and characterized for different conditions of beam polarizations between 0 and 90. As a result, the photo patterning appears to be strongly dependent on beam polarization in accordance with theoretical predictions. #

Domaines

Matériaux

Dates et versions

hal-02569550 , version 1 (15-05-2020)

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Citer

M. Salaun, M. Audier, M. Duneau, F Delyon. Holographic lithography of a two-dimensional hexagonal structure: Effect of beam polarization. Applied Surface Science, 2007, 254 (4), pp.850-854. ⟨10.1016/j.apsusc.2007.07.188⟩. ⟨hal-02569550⟩
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