Revisited Thermal and Plasma Enhanced Atomic Layer Deposition combined with Chemical Vapor Deposition processes of metal nitrides: challenges and opportunities

Elisabeth Blanquet (1) , Arnaud Mantoux (1) , Frédéric Mercier (1) , Raphael Boichot (1) , Ioana Nuta (1) , J.J. Blandin , Rémy Dendievel , Fivel Marc , Carmen Jiménez , David Munoz-Rojas , Daniel Bellet

1 SIMaP - Science et Ingénierie des Matériaux et Procédés

Domaines: Matériaux

Elisabeth Blanquet, Arnaud Mantoux, Frédéric Mercier, Raphael Boichot, Ioana Nuta, et al.. Revisited Thermal and Plasma Enhanced Atomic Layer Deposition combined with Chemical Vapor Deposition processes of metal nitrides: challenges and opportunities. MRS Fall Meeting, Symposium Advanced Atomic Layer Deposition and Chemical Vapor Deposition Techniques and Applications, Dec 2019, Boston, United States. ⟨hal-02414264⟩