Photolysis of CF 3 CH 2 CHO in the Presence of O 2 at 248 and 266 nm: Quantum Yields, Products, and Mechanism

M. Antiñolo (1) , C. Bettinelli , C. Jain , P. Dréan (2) , B. Lemoine (2) , J. Albaladejo (3) , E. Jimenez , C. Fittschen (4)

1 UCLM - Universidad de Castilla-La Mancha = University of Castilla-La Mancha
2 PhLAM - Laboratoire de Physique des Lasers, Atomes et Molécules - UMR 8523
3 Departamento de Química Física
4 PC2A - Physicochimie des Processus de Combustion et de l’Atmosphère - UMR 8522

Domaines: Sciences de l'environnement

M. Antiñolo, C. Bettinelli, C. Jain, P. Dréan, B. Lemoine, et al.. Photolysis of CF 3 CH 2 CHO in the Presence of O 2 at 248 and 266 nm: Quantum Yields, Products, and Mechanism. Journal of Physical Chemistry A, 2013, 117 (41), pp.10661-10670. ⟨10.1021/jp404823b⟩. ⟨hal-02410041⟩