Investigation of low temperature inductively coupled plasma chemical vapor deposition for flexible electronics - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2019

Investigation of low temperature inductively coupled plasma chemical vapor deposition for flexible electronics

Fichier non déposé

Dates et versions

hal-02401754 , version 1 (10-12-2019)

Identifiants

  • HAL Id : hal-02401754 , version 1

Citer

K. Yang, O. De Sagazan, Laurent Pichon, Anne-Claire Salaün, N. Coulon. Investigation of low temperature inductively coupled plasma chemical vapor deposition for flexible electronics. E-MRS 2019 Spring Meeting, May 2019, Nice, France. ⟨hal-02401754⟩
28 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More