A new setup for localized implantation and live-characterization of keV energy multiply charged ions at the nanoscale

S. Guillous (1) , C. Bourin (1) , B. Ban D’etat (1) , A. Benyagoub (1) , A. Cassimi (1, 2) , C. Feierstein (1) , E. Gardés (1) , Eric Giglio (1, 3) , S. Girard (4) , C. Grygiel (1) , A. Houel (5) , H. Lebius (1) , A. Méry (1) , I. Monnet (1) , J.-M. Ramillon (1) , J. Rangama (1) , F. Ropars (1) , E. Verzeroli (5) , M. Viteau (6) , A. Delobbe (5)

1 CIMAP - UMR 6252 - Centre de recherche sur les Ions, les MAtériaux et la Photonique
2 AMA - Atomes, Molécules et Agrégats
3 SIMUL - Simulation
4 IFREMER - Institut Français de Recherche pour l'Exploitation de la Mer
5 ZAC Saint Charles - Orsay Physics
6 LAC - Laboratoire Aimé Cotton

An innovative experimental setup, PELIICAEN, allowing the modification of materials and the study of the effects induced by multiply charged ion beams at the nanoscale is presented. This ultra-high vacuum (below 5 × 10−10 mbar) apparatus is equipped with a focused ion beam column using multiply charged ions and a scanning electron microscope developed by Orsay Physics, as well as a scanning probe microscope. The dual beam approach coupled to the scanning probe microscope achieves nanometer scale in situ topological analysis of the surface modifications induced by the ion beams. Preliminary results using the different on-line characterization techniques to study the formation of nano-hillocks on silicon and mica substrates are presented to illustrate the performances of the setup

Domaines: Physique des Hautes Energies - Expérience [hep-ex]

S. Guillous, C. Bourin, B. Ban D’etat, A. Benyagoub, A. Cassimi, et al.. A new setup for localized implantation and live-characterization of keV energy multiply charged ions at the nanoscale. Review of Scientific Instruments, 2016, 87 (11), pp.113901. ⟨10.1063/1.4966675⟩. ⟨hal-02394850⟩