Skip to Main content Skip to Navigation
Journal articles

The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films

Abstract : Non-stoichiometric Ni1-xO thin films were prepared on glass substrate by direct current reactive magnetron sputtering in a large range of oxygen partial pressure (0≤pO2≤1Pa). The dependence of the deposited film structure and properties on oxygen stoichiometry were systematically analyzed by X-ray diffraction, X-ray reflectivity, X-ray photoemission spectroscopy, Raman spectroscopy, atomic force microscopy, UV–vis measurements and electrical transport properties measurements. The deposition rates, surface morphology and opto-electrical properties are very sensitive to the oxygen partial pressure lower than 0.05Pa due to the presence of metallic nickel cluster phase determined by X-ray diffraction, X-ray reflectivity and XPS spectroscopy. Presence of nanocrystallized NiO phase was highlighted even for pO2=0Pa. For pO2>0.05Pa, only the NiO phase was detected. Progressive appearance of Ni3+ species is characterized by a fine increase of the lattice parameter and (111) preferred orientation determined by grazing angle X-ray diffraction, fine increase of the X-ray reflectivity critical angle, displacement of the Ni 2p3/2 signal towards lower energy, significant increase of the electrical conductivity and decrease of the total transmittance. Quantification of Ni3+ by XPS method is discussed. We also showed that the use of Raman spectroscopy was relevant for demonstrating the presence of Ni3+ in the Ni1-xO thin films.
Complete list of metadatas

Cited literature [45 references]  Display  Hide  Download

https://hal.archives-ouvertes.fr/hal-02378499
Contributor : Open Archive Toulouse Archive Ouverte (oatao) <>
Submitted on : Monday, November 25, 2019 - 11:28:10 AM
Last modification on : Friday, January 10, 2020 - 9:08:27 PM
Document(s) archivé(s) le : Wednesday, February 26, 2020 - 3:40:27 PM

File

Wang_25120.pdf
Files produced by the author(s)

Identifiers

Collections

Citation

Mengying Wang, Yohann Thimont, Lionel Presmanes, Xungang Diao, Antoine Barnabé. The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films. Applied Surface Science, Elsevier, 2017, 419, pp.795-801. ⟨10.1016/j.apsusc.2017.05.095⟩. ⟨hal-02378499⟩

Share

Metrics

Record views

31

Files downloads

82