A Self-Limited Atomic Layer Deposition of WS 2 Based on the Chemisorption and Reduction of Bis( t -butylimino)bis(dimethylamino) Complexes

Yanlin Wu , Muhammad Hamid Raza , Yen-Chun Chen , Patrick Amsalem (1) , Sebastian Wahl , Kai Skrodczky , Xiaomin Xu , Kapil Shyam Lokare , Medet Zhukush (2) , Pooja Gaval (2) , Norbert Koch (1) , Elsje Alessandra Quadrelli (2) , Nicola Pinna (1)

1 HU Berlin - Humboldt-Universität zu Berlin = Humboldt University of Berlin = Université Humboldt de Berlin
2 C2P2 - Laboratoire de Chimie, Catalyse, Polymères et Procédés, R 5265

Domaines: Chimie; Matériaux

Yanlin Wu, Muhammad Hamid Raza, Yen-Chun Chen, Patrick Amsalem, Sebastian Wahl, et al.. A Self-Limited Atomic Layer Deposition of WS 2 Based on the Chemisorption and Reduction of Bis( t -butylimino)bis(dimethylamino) Complexes. Chemistry of Materials, 2018, 31 (6), pp.1881-1890. ⟨10.1021/acs.chemmater.8b03921⟩. ⟨hal-02367949⟩