(Sr,La)-(Ta,Ti)-O-N perovskite oxide and oxynitride films: influence of the deposition and annealing conditions on the structure and electrical properties - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2019

(Sr,La)-(Ta,Ti)-O-N perovskite oxide and oxynitride films: influence of the deposition and annealing conditions on the structure and electrical properties

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Matériaux
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hal-02134839 , version 1 (20-05-2019)

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  • HAL Id : hal-02134839 , version 1

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Laurent Le Gendre, Claire Le Paven, Mohamad Haydoura, Ratiba Benzerga, Florent Marlec, et al.. (Sr,La)-(Ta,Ti)-O-N perovskite oxide and oxynitride films: influence of the deposition and annealing conditions on the structure and electrical properties. 10th International Symposium on NiTrides (ISNT 2019), Jun 2019, Barcelone, Spain. ⟨hal-02134839⟩
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