High temperature chemical vapor deposition of aluminum nitride thin films and coatings: properties and applications

Michel Pons (1) , Danying Chen (1) , Manoel Jacquemin , Juan Su (1) , Raphael Boichot (1) , Frederic Mercier (1) , Elisabeth Blanquet (1) , Sabine Lay (1) , Johan Colas , Ludovic Charpentier (2) , Marianne Balat-Pichelin (2)

1 SIMaP - Science et Ingénierie des Matériaux et Procédés
2 PROMES - Procédés, Matériaux et Energie Solaire

Domaines: Matériaux

Michel Pons, Danying Chen, Manoel Jacquemin, Juan Su, Raphael Boichot, et al.. High temperature chemical vapor deposition of aluminum nitride thin films and coatings: properties and applications. 2nd International Conference on materials science and engineering, Mar 2019, Cairo, Egypt. ⟨hal-02119556⟩