(Invited) Challenges and Opportunities in the Design of Tunnel FETs: Materials, Device Architectures, and Defects - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2014
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hal-02066006 , version 1 (13-03-2019)

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David Esseni, Marco Pala, Revelant A., P. Palestri, M. Li, et al.. (Invited) Challenges and Opportunities in the Design of Tunnel FETs: Materials, Device Architectures, and Defects. 226th ECS and SMEQ Joint International Meeting: SiGe,Ge and Related Compounds: Materials, Processing and Devices 6, S. Kar, M. Houssa, H. Jagannathan, K. Kita, D. Landheer, D. Misra and S. Van Elshocht, Oct 2014, Cacun, Mexico. ⟨hal-02066006⟩
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