Development of Niobium Nitride based Highly Sensitive Resistive Probes for Nanoscale Scanning Thermal Microscopy

Rahul Swami (1) , Gwénäelle Julié (2) , Simon Ledenmat (3) , Jean-François Motte (2) , Ali Alkurdi (4) , Pierre-Olivier Chapuis (4) , Séverine Gomès (4) , Olivier Bourgeois (1)

1 NEEL - TPS - Thermodynamique et biophysique des petits systèmes
2 NEEL - Nanofab - Nanofabrication
3 IME Nanotech
4 CETHIL - Centre d'Energétique et de Thermique de Lyon

Domaines: Thermique [physics.class-ph]

Rahul Swami, Gwénäelle Julié, Simon Ledenmat, Jean-François Motte, Ali Alkurdi, et al.. Development of Niobium Nitride based Highly Sensitive Resistive Probes for Nanoscale Scanning Thermal Microscopy. Eurotherm 111: Nanoscale and Microscale Heat Transfer VI, Dec 2018, Levi, Finland. ⟨hal-02025433⟩