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Article Dans Une Revue Superconductor Science and Technology Année : 2019

Improvement of the critical temperature of NbTiN films on III-nitride substrates

Résumé

In this paper, we study the impact of using III-nitride semiconductors (GaN, AlN) as substrates for ultrathin (11 nm) superconducting films of NbTiN deposited by reactive magnetron sputtering. The resulting NbTiN layers are (111)-oriented, fully relaxed, and they keep an epitaxial relation with the substrate. The higher critical superconducting temperature (Tc=11.8 K) was obtained on AlN-on-sapphire, which was the substrate with smaller lattice mismatch with NbTiN. We attribute this improvement to a reduction of the NbTiN roughness, which appears associated with the relaxation of the lattice misfit with the substrate. On AlN-onsapphire, superconducting nanowire single photon detectors were fabricated and tested, obtaining external quantum efficiencies that are in excellent agreement with theoretical calculations.

Dates et versions

hal-02013303 , version 1 (10-02-2019)

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Houssaine Machhadani, Julien Zichi, Catherine Bougerol, Stéphane Lequien, Jean-Luc Thomassin, et al.. Improvement of the critical temperature of NbTiN films on III-nitride substrates. Superconductor Science and Technology, 2019, 32 (3), pp.035008. ⟨10.1088/1361-6668/aaf99d⟩. ⟨hal-02013303⟩
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