Detailed analysis of frequency-dependent impedance in pseudo-MOSFET on thin SOI film

S. Sato (1) , Y. Omura (2) , G. Ghibaudo (1) , L. Benea (1) , S. Cristoloveanu (1)

1 IMEP-LAHC - Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation
2 Kansai University

This paper reports detailed measurements of impedance in frequency domain and discusses the mechanisms affecting the ac response of pseudo-MOSFET method for SOI wafer with thin SOI film. The interplay between capacitance, channel resistance and contact resistance is demonstrated. Solutions for obtaining reliable C-V curves are proposed.

Mots clés: pseudo-MOSFET; impedance; split-CV; contact resistance

Domaines: Micro et nanotechnologies/Microélectronique

S. Sato, Y. Omura, G. Ghibaudo, L. Benea, S. Cristoloveanu. Detailed analysis of frequency-dependent impedance in pseudo-MOSFET on thin SOI film. 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Mar 2018, Granada, Spain. pp.221-224, ⟨10.1109/ULIS.2018.8354774⟩. ⟨hal-02007662⟩