Comparison of Bottom-Up and Top-Down 3C-SiC NWFETs
Résumé
The until-now demonstrated SiC-Nanowire Field Effect Transistors (NWFETs) have exhibited poor performance due to the high residual doping of the NWs as well as the bad interface with the gate dielectrics. Top-down NWs have been used for the SiC NWFETs fabrication on the basis of low-doped 3C-SiC material and eliminating, thus, the first reason. The transistors with top-down grown NWs exhibited three orders of magnitude higher current and transconductance values with respect to SiC NWFETs with bottom-up grown NWs. Nevertheless, it was not possible to switch-off the transistors showing the importance of interface with the gate dielectrics.