Body factor scaling in UTBB SOI with supercoupling effect

K.R.A. Sasaki (1) , J.A. Martino (1) , C. Navarro (2) , M. Bawedin (2) , F. Andrieu (3) , S. Cristoloveanu (2)

1 LSI/PSI/USP - University of Sao Paulo - Brazil
2 IMEP-LAHC - Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation
3 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information

Focusing on the channel length scalability, this paper analyzes the coupling coefficient (body factor) in thick (25nm) and thin (7nm) UTBB SOI devices. Experimental data and simulations demonstrate that the supercoupling effect further improves the device scalability and operation in thin silicon films. The impact of thinning the gate oxide and body on the inter-channel coupling is also documented.

Mots clés: channel length; supercoupling; body factor; coupling coefficient; UTBB SOI

Domaines: Micro et nanotechnologies/Microélectronique

K.R.A. Sasaki, J.A. Martino, C. Navarro, M. Bawedin, F. Andrieu, et al.. Body factor scaling in UTBB SOI with supercoupling effect. 2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Jan 2016, Vienna, Austria. pp.174-177, ⟨10.1109/ULIS.2016.7440081⟩. ⟨hal-02006211⟩