Multi-barrier height characterization and DLTS study on Ti/W 4H-SiC Schottky Diode - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2018

Multi-barrier height characterization and DLTS study on Ti/W 4H-SiC Schottky Diode

Résumé

Schottky barrier height (SBH) has been characterized on 4H-SiC Schottky diodes with metal contact of Ti/W by Current-Voltage (I-V) and Capacitance-Voltage (C-V) measurements between 80 K and 400 K. Multi-barrier has been recognized and calculated according to different models. No clear difference has been found between single barrier diode and diode with multi-barrier from DLTS tests. Evolution on the I-V characteristics has been observed after high temperature annealing. The effect of annealing at room temperature (RT) and high temperature DLTS scan (stress under high temperature) have also been studied on both static characteristics and DLTS results.

Mots clés

Domaines

Electronique
Fichier principal
Vignette du fichier
cgri66.pdf (879.69 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)
Loading...

Dates et versions

hal-02004837 , version 1 (02-02-2019)

Identifiants

  • HAL Id : hal-02004837 , version 1

Citer

Teng Zhang, Christophe Raynaud, Dominique Planson. Multi-barrier height characterization and DLTS study on Ti/W 4H-SiC Schottky Diode. ECSCRM'18, Sep 2018, Birmingham, United Kingdom. ⟨hal-02004837⟩
42 Consultations
70 Téléchargements

Partager

Gmail Facebook X LinkedIn More