Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses

Faycal Chandoul (1) , Hatem Moussa (2) , Karima Jouini (3) , Abdelwaheb Boukhachem (1) , Faouzi Hosni (4) , Mohamed Slim Fayache (1) , Raphaël Schneider (2)

1 University of Tunis - Faculty of Sciences of Tunis
2 LRGP - Laboratoire Réactions et Génie des Procédés
3 CNSTN - Laboratory on Energy and Matter for Nuclear Sciences Development
4 Laboratory on Energy and Matter for Nuclear Sciences Development

Domaines: Matériaux

Faycal Chandoul, Hatem Moussa, Karima Jouini, Abdelwaheb Boukhachem, Faouzi Hosni, et al.. Investigation of the properties of nanostructured nickel oxide NiO thin films irradiated at different γ-doses. Journal of Materials Science: Materials in Electronics, 2019, 30 (1), pp.348-358. ⟨10.1007/s10854-018-0299-z⟩. ⟨hal-02939434⟩