Virtual Metrology applied in Run-to-Run Control for a Chemical Mechanical Planarization process

Document type :
Journal articles
Complete list of metadatas

https://hal.archives-ouvertes.fr/hal-01893099
Contributor : Guillaume Graton <>
Submitted on : Thursday, October 11, 2018 - 10:01:30 AM
Last modification on : Saturday, October 13, 2018 - 1:22:16 AM

Links full text

Identifiers

Citation

M. Jebri, M. El Adel, G. Graton, M. Ouladsine, J. Pinaton. Virtual Metrology applied in Run-to-Run Control for a Chemical Mechanical Planarization process. Journal of Physics: Conference Series, IOP Publishing, 2017, 783, ⟨10.1088/1742-6596/783/1/012042⟩. ⟨hal-01893099⟩

Share

Metrics

Record views

72