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Communication Dans Un Congrès Année : 2018

Comprehensive Study into Underlying Mechanisms of Anomalous Gate Leakage Degradation in GaN High Electron Mobility Transistors

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Electronique
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Dates et versions

hal-01718850 , version 1 (27-02-2018)

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  • HAL Id : hal-01718850 , version 1

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Mukherjee Kalparupa, Frédéric Darracq, Arnaud Curutchet, Nathalie Malbert, Nathalie Labat. Comprehensive Study into Underlying Mechanisms of Anomalous Gate Leakage Degradation in GaN High Electron Mobility Transistors. IRPS 2018, Mar 2018, San Francisco, United States. ⟨hal-01718850⟩
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