Templated Sub-100-nm-Thick Double-Gyroid Structure from Si-Containing Block Copolymer Thin Films

Abstract : The directed self-assembly of diblock copolymer chains (poly(1,1-dimethylsilacyclobutane)-block-polystyrene, PDMSB-b-PS) into a thin film double gyroid structure is described. A decrease of the kinetics of a typical double-wave pattern formation is reported within the 3D-nanostructure when the film thickness on mesas is lower than the gyroid unit cell. However, optimization of the solvent-vapor annealing process results in very large grains (over 10 μm²) with specific orientation (i.e., parallel to the air substrate) and direction (i.e., along the groove direction) of the characteristic (211) plane, demonstrated by templating sub-100-nm-thick PDMSB-b-PS films.
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Small, Wiley-VCH Verlag, 2017, 13 (20), pp.1603777. 〈10.1002/smll.201603777〉
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https://hal.archives-ouvertes.fr/hal-01505528
Contributeur : Eric Cloutet <>
Soumis le : mardi 11 avril 2017 - 14:15:44
Dernière modification le : jeudi 11 janvier 2018 - 06:28:09

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Karim Aissou, Muhammad Mumtaz, Giuseppe Portale, Cyril Brochon, Eric Cloutet, et al.. Templated Sub-100-nm-Thick Double-Gyroid Structure from Si-Containing Block Copolymer Thin Films. Small, Wiley-VCH Verlag, 2017, 13 (20), pp.1603777. 〈10.1002/smll.201603777〉. 〈hal-01505528〉

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