Texturation control of Pb(Zr,Ti)O3 films on SOI substrate

C. Debray (1) , C. Delcamp , Z. El-Friakhj , J. Henri , Jérémy Lhuillier (2, 3) , Qiang Liu (3) , O. Marconot , Simon Martin (4, 5) , M. Piquemal , D. Poussin , H. Tanaka , David Albertini (6) , Nicolas Baboux (5) , Brice Gautier (5) , J. Delaunay (7) , Yves Robach (8) , Pédro Rojo Romeo (3) , Bertrand Vilquin (8)

1 Epilepsie et Ischemie Cerebrale
2 EE - Ampère, Département Energie Electrique
3 INL - Photonique - INL - Nanophotonique
4 IGUL - Institut de Géographie [Lausanne]
5 INL - DE - INL - Dispositifs Electroniques
6 INL - Nanolyon - INL - Plateforme Technologique Nanolyon
7 CHU Nantes - Centre Hospitalier Universitaire de Nantes
8 INL - H&N - INL - Hétéroepitaxie et Nanostructures

Two low-cost methods, sputtering deposition and sol–gel processes, were used to study the effects of bottom electrodes preparation on the microstructure evolution and texture development of oriented PZT films. Microstructure development and perovskite content are strongly dependent on the temperature deposition of the Pt bottom electrode on SOI substrate and on the post-deposition annealing heating rate. Fast heating rate forms a dense fine-grained microstructure with polycristalline orientation. Very slow heating rate leads to (001) orientations.The texture selection of PZT films is independent of deposition process but sensitive to the Pt bottom electrode temperature deposition. Correlation and comparison of oriented sol–gel and sputtered PZT films with electrical properties are also made.

Domaines: Sciences de l'ingénieur [physics]; Optique / photonique; Micro et nanotechnologies/Microélectronique; Matériaux

C. Debray, C. Delcamp, Z. El-Friakhj, J. Henri, Jérémy Lhuillier, et al.. Texturation control of Pb(Zr,Ti)O3 films on SOI substrate. ICMAST, 2014, Bilbao, Spain. ⟨hal-01489823⟩