Ga2O3 filsm alloyed with SnO2 and treated by RF plasma : an interesting way for the development of transparent contacts for UV-emitting photonics devices - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2016

Ga2O3 filsm alloyed with SnO2 and treated by RF plasma : an interesting way for the development of transparent contacts for UV-emitting photonics devices

Résumé

Layers of Ga2O3 alloyed up to 15 at% with Sn4+ has been studied after treatment by RF plasma. An increased conductivity was measured which is an interesting step towards transparent contacts for UV-emitting photonics devices.

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Matériaux
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Dates et versions

hal-01422031 , version 1 (23-12-2016)

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Frédéric Genty, Alban Maertens, Samuel Margueron, Adulfas Abrutis, Thierry Belmonte, et al.. Ga2O3 filsm alloyed with SnO2 and treated by RF plasma : an interesting way for the development of transparent contacts for UV-emitting photonics devices. International Conference on Fiber Optics and Photonics - PHOTONICS2016, Dec 2016, Kanpur, India. ⟨10.1364/photonics.2016.tu2d.1⟩. ⟨hal-01422031⟩
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