Electrochemical deposition of a luminescent alkoxysilyl-based fluorenone film exhibiting halide sensitivity

G. Herlem (1) , A. Kandory (1, 2) , R. Kinghat Tangou (3) , T. Gharbi (1) , H. Cattey (4) , M. Knorr (3) , A. Khatyr (3)

1 NIT / NANOMEDECINE - Nanomédecine, imagerie, thérapeutique - UFC (UR 4662)
2 University of Diyala - University of Diyala
3 UTINAM - Univers, Transport, Interfaces, Nanostructures, Atmosphère et environnement, Molécules (UMR 6213)
4 ICMUB - Institut de Chimie Moléculaire de l'Université de Bourgogne [Dijon]

Domaines: Chimie

G. Herlem, A. Kandory, R. Kinghat Tangou, T. Gharbi, H. Cattey, et al.. Electrochemical deposition of a luminescent alkoxysilyl-based fluorenone film exhibiting halide sensitivity. ECS Journal of Solid State Science and Technology, 2017, 6 (1), pp.R7-R13. ⟨10.1149/2.0031701jss⟩. ⟨hal-01415498⟩