Simulation and fabrication of silicon nitride microring resonator by DUV lithography

Giuseppe A Cirino (1, 2) , Luis A Barea (3) , Antonio A von Zuben (3) , Hervé Lhermite (1) , Bruno Bêche (4) , Olivier de Sagazan (1) , Newton Frateschi (3) , Tayeb M-Brahim (1)

1 IETR - Institut d'Electronique et de Télécommunications de Rennes
2 Departamento de Engenharia Elétrica
3 IFGW - Instituto de Fisica Gleb Wataghin
4 IPR - Institut de Physique de Rennes

This work reports the design and fabrication of silicon nitride-based microresonators by employing DUV optical lithography and ICP-RIE plasma etching. Microring devices with high Q factors provide high sensitivity and low detection limit, enabling their use in biochemical sensing applications. With these properties, the devices can be used to detect and quantify the biomolecules present in a homogeneous solution, by detecting an effective refractive index change, without using fluorescent labels.

Mots clés: Biochemical sensing; Microcavity resonator; Silicon photonics; DUV Lithography; Evanescent coupling

Domaines: Optique / photonique; Micro et nanotechnologies/Microélectronique; Matériaux

Giuseppe A Cirino, Luis A Barea, Antonio A von Zuben, Hervé Lhermite, Bruno Bêche, et al.. Simulation and fabrication of silicon nitride microring resonator by DUV lithography. IEEE conference publications, 2016, pp.1 - 4. ⟨10.1109/SBMicro.2016.7731346⟩. ⟨hal-01398394⟩