Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing

Wubin Bai (1) , Adam F. Hannon (1) , Kevin W. Gotrik (1) , Hong Kyoon Choi (1) , Karim Aissou (2, 3) , George Liontos (4) , Alfredo Alexander-Katz (1) , Apostolos Avgeropoulos (4) , Caroline A. Ross (1)

1 MIT, Dept Mat Sci & Engn, Cambridge
2 LCPO - Laboratoire de Chimie des Polymères Organiques
3 Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
4 University of Ioannina

Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-PDMS) diblock copolymer (SD75) subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology consists of spheres, cylinders, perforated lamellae or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nano patterning applications.

Mots clés: DIBLOCK COPOLYMER; MOLECULAR-WEIGHT; PHASE; ORIENTATION; ARRAYS; LITHOGRAPHY; PATTERNS; POLY(DIMETHYLSILOXANE); DIMETHYLSILOXANE; TRANSITIONS

Domaines: Polymères

Wubin Bai, Adam F. Hannon, Kevin W. Gotrik, Hong Kyoon Choi, Karim Aissou, et al.. Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing . Macromolecules, 2014, 47 (17), pp.6000-6008. ⟨10.1021/ma501293n⟩. ⟨hal-01369910⟩