Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing

Abstract : Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-PDMS) diblock copolymer (SD75) subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology consists of spheres, cylinders, perforated lamellae or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nano patterning applications.
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https://hal.archives-ouvertes.fr/hal-01369910
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Submitted on : Wednesday, September 21, 2016 - 4:25:28 PM
Last modification on : Thursday, January 11, 2018 - 6:28:09 AM

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Wubin Bai, Adam F. Hannon, Kevin W. Gotrik, Hong Kyoon Choi, Karim Aissou, et al.. Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing . Macromolecules, American Chemical Society, 2014, 47 (17), pp.6000-6008. ⟨10.1021/ma501293n ⟩. ⟨hal-01369910⟩

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