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Communication Dans Un Congrès Année : 2016

Energetic contributions at the substrate in various regimes of reactive magnetron sputter deposition

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hal-01358840 , version 1 (01-09-2016)

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  • HAL Id : hal-01358840 , version 1

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Mariem El Mokh, Amael Caillard, Thomas Lecas, Anne Lise Thomann. Energetic contributions at the substrate in various regimes of reactive magnetron sputter deposition. 15th International Conference on Plasma Surface Engineering, Sep 2016, Garmisch-Partenkirchen, Germany. ⟨hal-01358840⟩
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