Studies on atomic layer deposition of MOF-5 thin films

Leo D. Salmi , Mikko J. Heikkila , Esa Puukilainen , Timo Sajavaara , David Grosso (1) , Mikko Ritala

1 LCMCP (site Paris VI) - Laboratoire de Chimie de la Matière Condensée de Paris (site Paris VI)

Deposition of MOF-5 thin films from vapor phase by atomic layer deposition (ALD) was studied at 225-350 degrees C. Zinc acetate (ZnAc2) and 1,4-benzenedicarboxylic acid (1,4-BDC) were used as the precursors. The resulting films were characterized by UV-Vis spectrophotometry, Fourier transform infrared spectroscopy (FTIR), optical microscopy, X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), time-of-flight elastic recoil detection analysis (TOF-ERDA), isopropanol adsorption tests, and nanoindentation. It was found out that the as-deposited films were amorphous but crystallized in humid conditions at room temperature. The crystalline films had an unidentified structure with a large unit cell similar to MOF-5. High temperature XRD (HTXRD) of the films showed structural changes at 200 and 300 degrees C. A complete decomposition occurred at 400 degrees C. Adsorption tests showed no porosity in the films crystallized in the moist air. These films were recrystallized into the MOF-5 phase in an autoclave with dimethylformamide (DMF) at 150 degrees C which was confirmed by XRD. Two main uptake regions were seen in the isopropanol adsorption tests corresponding to micro- and macroporosity.

Mots clés: ALD; Metal-organic frameworks; MOF-5; Hybrid materials

Domaines: Matériaux

Leo D. Salmi, Mikko J. Heikkila, Esa Puukilainen, Timo Sajavaara, David Grosso, et al.. Studies on atomic layer deposition of MOF-5 thin films. Microporous and Mesoporous Materials, 2013, 182, pp.147-154. ⟨10.1016/j.micromeso.2013.08.024⟩. ⟨hal-01289765⟩