Ultrafast Atomic Diffusion Inducing a Reversible (2 root 3x2 root 3)R30 degrees <-> (root 3x root 3)R30 degrees Transition on Sn/Si(111) : B - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Physical Review Letters Année : 2015

Ultrafast Atomic Diffusion Inducing a Reversible (2 root 3x2 root 3)R30 degrees <-> (root 3x root 3)R30 degrees Transition on Sn/Si(111) : B

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Dynamical phase transitions are a challenge to identify experimentally and describe theoretically. Here, we study a new reconstruction of Sn on silicon and observe a reversible transition where the surface unit cell divides its area by a factor of 4 at 250 degrees C. This phase transition is explained by the 24-fold degeneracy of the ground state and a novel diffusive mechanism, where four Sn atoms arranged in a snakelike cluster wiggle at the surface exploring collectively the different quantum mechanical ground states.
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hal-01271640 , version 1 (28-06-2023)

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Waked Srour, Daniel G. Trabada, José Ignacio Martinez, Fernando Flores, José Ortega, et al.. Ultrafast Atomic Diffusion Inducing a Reversible (2 root 3x2 root 3)R30 degrees <-> (root 3x root 3)R30 degrees Transition on Sn/Si(111) : B. Physical Review Letters, 2015, 114 (19), pp.196101. ⟨10.1103/PhysRevLett.114.196101⟩. ⟨hal-01271640⟩
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