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Chemical vapor deposition of low reflective cobalt (II) oxide films

Abstract : Low reflective CoO coatings are processed by chemical vapor deposition from Co2(CO)8at temperatures between 120◦C and 190◦C without additional oxygen source. The optical reflectivity in the visible and near infrared regions stems from 2 to 35% depending on deposition temperature. The combination of specific microstructural features of the coatings, namely a fractal “cauliflower” morphology and a grain size distribution more or less covering the near UV and IR wavelength ranges enhance light scattering and gives rise to a low reflectivity. In addition, the columnar morphology results in a density gradient in the vertical direction that we interpret as a refractive index gradient lowering reflectivity further down.The coating formed at 180◦C shows the lowest average reflectivity (2.9%), and presents an interesting deep black diffuse aspect.
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https://hal.archives-ouvertes.fr/hal-01264368
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Submitted on : Friday, March 4, 2016 - 10:23:08 AM
Last modification on : Tuesday, November 24, 2020 - 1:18:05 PM
Long-term archiving on: : Sunday, June 5, 2016 - 10:12:28 AM

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Eliane Amin-Chalhoub, Thomas Duguet, Diane Samélor, Olivier Debieu, Elisabeta Ungureanu, et al.. Chemical vapor deposition of low reflective cobalt (II) oxide films. Applied Surface Science, Elsevier, 2016, 360, pp.540-546. ⟨10.1016/j.apsusc.2015.10.188⟩. ⟨hal-01264368⟩

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