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Article Dans Une Revue Journal of Physical Chemistry C Année : 2014

Mechanism of Benzene Mono layer Formation on Si(100)-2x1 Studied by Surface Differential Reflectance Spectroscopy

R. Coustel
O. Pluchery
  • Fonction : Auteur
N. Witkowski
  • Fonction : Auteur
Yves Borensztein

Résumé

The kinetics of benzene adsorption on a Si(100)-2x1 surface has been monitored using real-time surface differential reflectance spectroscopy. A model with two adsorption modes is confirmed where benzene binds to the silicon surface in tight-bridge (TB) and butterfly (BF) configurations. For the first time, the balance between these modes is probed continually as the adsorption progressed and the resulting kinetics is discussed. In a first stage, benzene adsorbs in the TB configuration until it reaches 17% of a monolayer. In the second stage, additional molecules adsorb in the BF configuration and TB gradually converts into BF. At saturation, about 50% of the dimers are occupied by BF. Moreover, a Monte Carlo simulation provides a proper description of the adsorption kinetics.
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Dates et versions

hal-01238950 , version 1 (07-12-2015)

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Citer

R. Coustel, O. Pluchery, N. Witkowski, Yves Borensztein. Mechanism of Benzene Mono layer Formation on Si(100)-2x1 Studied by Surface Differential Reflectance Spectroscopy. Journal of Physical Chemistry C, 2014, 118 (20), pp.10740-10745. ⟨10.1021/jp412327p⟩. ⟨hal-01238950⟩
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