SiGe Low Temperature Epitaxy by PECVD on III-V MOVPE Grown Material for High Efficiency Tandem Solar Cell Applications - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2015

SiGe Low Temperature Epitaxy by PECVD on III-V MOVPE Grown Material for High Efficiency Tandem Solar Cell Applications

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hal-01232098 , version 1 (22-11-2015)

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  • HAL Id : hal-01232098 , version 1

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Jean Decobert, Romain Cariou, Kevin Louarn, Catherine Fortin, Raphaël Lachaume, et al.. SiGe Low Temperature Epitaxy by PECVD on III-V MOVPE Grown Material for High Efficiency Tandem Solar Cell Applications. 16th European Workshop on Metalorganic Vapour Phase Epitaxy, EWMOVPE XVI, Jun 2015, Lund, Sweden. ⟨hal-01232098⟩
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